| To pattern parts of a thin film or most of a substrate. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist." A series of chemical treatments then etch the exposure pattern into, or allow for the deposition of, a new material in the desired pattern onto the material beneath the photoresist.
For the quote of these types of services, it is required to have the photo-masks in advance, since here only channel motifs are available. | Costs
General Public $1,000.00 UASLP $500.00 |
| With applications in altering the refractive index of channel and planar waveguides.
Also for research activities in Chemistry. Per event, does not include materials | General Public
$2,000.00 UASLP $850.00 |
| All of these techniques have multiple applications in industry and research in in situ growth characterization such as differential reflectance, voltage measurement and laser light scattering.
To quote this service, it is necessary to know the characteristics of the samples and establish the scope of the process in a prior collaboration agreement. By project and defining in advance the scope of the research by agreement. | General Public
$ UASLP $ |
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