MEASUREMENT AND CHARACTERIZATION
| Non-contact, non-destructive method that allows probing the electronic structure of materials.
Essentially, light is directed onto a sample, where it is absorbed and a process called photo-excitation can occur.
Photo-excitation causes the atoms of the material to go to a higher electronic state, and then release energy (photons), when they relax, they return to a lower energy level.
The emission of light, or luminescence through this process is Photoluminescence. | Costs General Public $5,000.00 UASLP $1,600.00 |
| Mechano-optical instrument that forms images of surfaces using a probe or microlever that runs through the sample doing a line-by-line scan depending on the position, generating an image.
This technique allows obtaining 3D topographic images, making measurements of the order of nm, detecting nN forces, making measurements of visco-elasticity and hardness of the sample, among others. | General Public $5,800.00 UASLP $2,500.00 |
| Optoelectronics is a part of photonics related to the study and application of electronic devices that interact with light or systems in which electrons and photons coexist. Optoelectronic devices operate as electrical-optical or optical-electrical transducers. | General Public $2,800.00 UASLP $1,400.00 |
| Technique for the investigation of nanostructures that breaks the far-field resolution limit by exploiting the properties of evanescent waves.
Light from the excitation laser is focused through an aperture with a diameter smaller than the excitation wavelength, resulting in an evanescent field (or near field) on the far side of the aperture.
When the sample is scanned at a small distance below the aperture, the optical resolution of the transmitted or reflected light is limited only by the diameter of the aperture.
As in optical microscopy, the contrast mechanism can be easily adapted to study different properties, such as refractive index, chemical structure, and local stress. | General Public $5,800.00 UASLP $2,500.00 |
Equipment for high resolution spectral response analysis
| Used in optical characterization techniques in the visible, microscopic and at low temperatures, analysis of the light emission of a sample, among others.
Generally oriented to both the research and industrial branches and essentially to know the properties of materials in an isolated environment and in an environment of controlled extreme thermal disturbance between the ranges 4°K and 100°C.
Note: preparation and 4 measurement, includes consumables (helium) and advice.
For the use of the spectrometer the cost includes advice. To quote these types of services, it is necessary to know the characteristics of the samples. | UASLP $2,500.00 General Public $2,000.00 UASLP $1,000.00 |
| For nanolayer assembly of devices such as light-emitting diodes, transistors and lasers from two-dimensional materials. | General Public |
| Chemical identification of molecules with applications in insulating polymers (filament coatings), orientation to quality metrology and archiving. | General Public $6,800 UASLP $2,900.00 |
| For chemical identification of molecules, with applications in crystallization processes, identification of polymorphs, polymerization reactions, hydrogenation reactions, chemical synthesis, biocatalysis and enzymatic catalysis and Flow Chemistry among others. | General Public $5,000.00 UASLP $2,900.00 |
Flir thermographic camera (for rent)
| Measuring range
Per hour and with a deposit charge upon return of the equipment. | General Public $3,000.00 UASLP $1,500.00 |
DEVELOPMENT OF SCIENTIFIC INSTRUMENTS
| An applicable, effective and low-cost method of analysis applicable to a wide range of industrial research and processes. | Costs
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Super Continuous Broadband Source for Fluorescence Experimentation
| Optical spectrum analysis method for fluorescence research, with wider application in Chemistry | General Public $5,800.00 UASLP $2,900.00 |
| For the study of devices and materials, whose characteristics depend on capacitance, inductance or resistance; In addition it can address a wide range of components, semiconductors, and material measurement applications in R&D and production environments. | General Public $2,800.00 UASLP $1,400.00 |
| Weighing between 52 gr/120 grs. (maximum) and 0.01 mg/0.1 mg (minimum), percentage weighing, formulation, differential weighing, density determination, high point retention, pipette adjustment, SQC. | General Public $500.00 UASLP $450.00 Event |
Portable Turbo-Molecular Vacuum Pump
| For analysis under near-perfect vacuum conditions, removing gas molecules at pressures in the order of 10^-5 -10^-7 torr. | General Public $3,000.00 UASLP $1,500.00 |
| Flir thermographic camera (for rent) | Measuring range minimum -25°C maximum 380°C Per hour and with a deposit charge upon return of the equipment. | General Public $3,000.00 UASLP $1,500.00 |
| Temperature range from 100 to 1100 degrees C for laboratory, heating applications such as annealing, crystallizing, calibration and heat treatment. For tubes with diameter 1 to 3 inch (2.5 to 7.6 cm) for loading, size flexibility. Per sample, it is necessary to have the nanotubes beforehand. | General Public $3,500.00 UASLP $2,000.00 |
Centrifuge up to 8000 rpm
| For the separation of samples that want to be analyzed in the laboratory by means of centrifugal force and to accelerate the decantation of their components or phases (in most cases a solid and a liquid), depending on the level of density that said sample contains. .
By sample. | General Public $1,000.00 UASLP $600.00 |
ADDITIONAL TECHNICAL SERVICES
| Photolithography larger than 10 microns | To pattern parts of a thin film or most of a substrate. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist." A series of chemical treatments then etch the exposure pattern into, or allow for the deposition of, a new material in the desired pattern onto the material beneath the photoresist. For the quote of these types of services, it is required to have the photo-masks in advance, since here only channel motifs are available. | Costs General Public $1,000.00 UASLP $500.00 |
| Ion Exchange Furnace | With applications in altering the refractive index of channel and planar waveguides.
Also for research activities in Chemistry. Per event, does not include materials. | General Public $2,000.00 UASLP $850.00 |
| Temperature Measurement with Thermocouple
Application of Different Vacuum Techniques Fluid control techniques Light Sources and Detectors | All of these techniques have multiple applications in industry and research in in situ growth characterization such as differential reflectance, voltage measurement and laser light scattering.
To quote this service, it is necessary to know the characteristics of the samples and establish the scope of the process in a prior collaboration agreement. By project and defining in advance the scope of the research by agreement. | General Public $ UASLP $ |
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